ComfyUI Extension: ComfyUI-RemoveBackgroundSuite
A matting toolkit based on ComfyUI, supporting multiple matting models and detail processing methods.
Custom Nodes (0)
README
ComfyUI-RemoveBackgroundSuite
A matting toolkit based on ComfyUI, supporting multiple matting models and detail processing methods.
Features
- Multiple Models: Support for various matting models including BiRefNet, RMBG, and more
- Detail Processing: Advanced mask processing capabilities for fine-tuning results
- User-Friendly: Simple and intuitive interface within ComfyUI
- High Performance: Optimized for both quality and speed
Installation
- Navigate to your ComfyUI's
custom_nodes
directory - Clone this repository:
git clone https://github.com/whmc76/ComfyUI-RemoveBackgroundSuite.git
- Install dependencies:
cd ComfyUI-RemoveBackgroundSuite
pip install -r requirements.txt
Usage
- Start ComfyUI
- The new nodes will appear in the node menu under the "RBS" category
- Connect the nodes as needed in your workflow
Models
The following models are supported:
- BiRefNet-General
- BiRefNet_dynamic
- BiRefNet_HR
- BiRefNet_HR-matting
- RMBG-2.0
Nodes
BiRefNetUltraV3_RBS
- Input: Image
- Output: Mask
- Parameters:
- Model Version: Select from available BiRefNet models
- Max Megapixels: Maximum image size for processing
Transparent Background Ultra (RBS)
- Input: Image
- Output: Transparent Image
- Parameters:
- Model Version: Select from available models
- Max Megapixels: Maximum image size for processing
Mask Process Details (RBS)
- Input: Mask
- Output: Processed Mask
- Parameters:
- Detail Method: Choose from VITMatte, PyMatting, or GuidedFilter
- Erode/Dilate: Control the trimap generation
- Black/White Point: Adjust mask levels
- Max Megapixels: Control processing resolution
Changelog
v1.1.2
- 修复了模型加载路径的问题
- 改进了模型自动下载功能
- 添加了缺失的依赖项
- 优化了错误处理和日志记录
v1.1.1
- Fixed VITMatte processing quality issues
- Optimized image size handling for different processing methods
- Improved mask processing workflow
v1.1.0
- Optimized dependency management
- Removed version constraints for better compatibility
- Removed unused dependencies
- Improved code organization
v1.0.0
- Initial release with core functionality
- Support for multiple matting models
- Basic mask processing capabilities
License
This project is licensed under the MIT License - see the LICENSE file for details.